Am 06.02.2012 10:44, schrieb Eric Smith:
On 02/05/2012 10:31 PM, Mouse wrote:
But now I'm curious. What sort of performance
degradation does PNP
exhibit? Slower switching? Higher power dissipation? And what's the
underlying difference behind it, do you know?
If I recall correctly (and I'm
no expert on solid-state physics, so I
could easily be wrong), the difference comes about because electron
mobility in silicon is about three times the hole mobility. Wikipedia
says Si at 300K has electron mobility of 1400 cm^2/V*s, vs. hole
mobility of 450 cm^2/V*s.
It is an academic issue. True, the electron mobility is
different for
holes and electrons, but it is not really the dominating factor.
Consider Germanium has even higher electron/hole mobility values (3900
vs. 1900 cm^2/Vs) than silicon, but this doesn't make it a better
semiconductor material per se.
Historically, germanium point contact transistors were mainly PNP for
production reasons, this changed to the reverse when mesa and planar
transistors based on silicon came up. This is because SiO2 makes up a
better insulator than GeO2.
For paired PNP/NPN transistors (e.g. complementary transistors on the
same die), one could expect a slightly higher h21fe and higher Ic for
the NPN part for a given matching Ube curve, but whether this is
relevant at all depends on the application. Usually, it isn't relevant,
and for single transistors, you can typically find a PNP with the same
or better characteristics than a given NPN.
This was different, again, historically, with Ge transistors having an
fT in the kHz range. And for extreme conditions, e.g. very high
frequency or very high power switching, one would nowadays no longer
consider bipolar transistors at all, but various types of MOSFETs.
--
Holger