On 01/20/2012 01:47 PM, Tony Duell wrote:
I was under the impression tha the oxide
dielectric film was
originally produced by a process that's much the same as the reforming
process.
It is.
I would seem that when the 'leakage current' gets very low then no more
oxide is goign to be depositied - -the film will not get any thicker.
After all, it's an electrolytic process.
There may be some trick the voltage profile (and/or controlling the
voltage as a fucntion of the leakage current). I susepct the official way
to do this is a trade secret, but there may be some details avaiable for
the older processes.
-tony